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Invited
Papers
The Symposium features a number of oral presentations of general interest. The present list
of confirmed speakers includes:
Correlating
Morphology with Electronic and Photoluminescence Properties in Oxidized
Silicon Nanoclusters
Professor John Carlisle
Department of Physics, Virginia Commonwealth University, Virginia,
U.S.A.
Quantum size effects in
nanostructured materials are of increasing interest in both basic
science and applications. The dependence of quantum size effects on
bonding structure and morphology in oxidized silicon nanoclusters is
established by correlating photoluminescence data with photon-yield
electronic structure measurements (SXF and NEXAFS) at the Advanced Light
Source. After removal from the growth chamber, our photoluminescence
(PL) results indicate that as the nanoclusters oxidize, the main PL peak
moves from 1.83 eV to 1.94 eV in energy. Our finding is that the
as-synthesized nanoclusters consist of a pure, crystalline Si core
within a nearly pure SiO2 shell. Very few suboxides are
present, and the oxidation process does not lead to an increase in the
amount of suboxides present within the particles. As the nanoclusters
oxidize, the radius of the crystalline core decreases in size, which
gives rise to the change in the position of the PL signal.
Main
Group K- and L-Edge and Transition Metal L-Edge Spectroscopy of Solid
and Gaseous Inorganic Compounds Soft X-ray Spectroscopy from 100 to
2000 eV
Professor Ronald Cavell
Chemistry Department, University of Alberta, Alberta, Canada
The
development of soft X-ray beamline facilities at the Canadian
Synchrotron Radiation Facility (CSRF) on the Aladdin ring at the
Synchrotron Radiation Center (SRC) in Stoughton, Wisconsin and the
development of HRMON at Aladdin has provided the necessary instrumental
capacity for the measurement of X-ray absorption spectra of compounds of
the main group elements - phosphorus, sulphur (both K and L edges),
nitrogen and oxygen (K edges). In addition, L edges of the first row
transition metals (Ti-Mn) are presently accessible. The instrumentation
spans the energy scale from 100 to approximately 3500eV. We have
measured X-ray absorption spectra of a wide collection of compounds
containing these listed elements. The
molecular species span the range of valence states and molecular
geometries. Both gaseous and solid state measurements have been
performed, dictated by the properties of the compounds. Our emphasis has
been on the exploration of highly oxidized compounds of phosphorus and
sulphur (e.g. OPF3, NSF3, PF5,
OSF4, SF5Cl
etc.) and on the study of transition metal compounds and complexes of
the elements from Ti to Mn. Examples will be drawn from selected groups
of measurements to illustrate the character and trends in the XANES
spectra and the chemical information that can be derived therefrom. In
many cases all edges of a molecular system have been explored (e.g.
nitrogen and oxygen edges in NO2, all sulphur and oxygen
edges in SO2 etc.)
and the contrasts in the spectral character which derives
from the dipole selection rules associated with each core level are
revealed.
New methods for studying surface reaction kinetics, compositional
heterogeneity, and interface properties with x-ray photoelectron spectroscopy
Professor Charles Fadley
Department of Physics,
University of California, Davis, and Lawrence Berkeley National
Laboratory, U.S.A.
Three new aspects of soft x-ray
photoelectron spectroscopy (XPS) making use of third-generation synchrotron radiation
will be discussed: time- and chemical state-resolved XPS, which permits following
surface reactions in real time; multi-atom resonant XPS, which permits directly
determining near-neighbor atomic identities and other bonding and magnetic properties;
and XPS excited by x-ray standing waves from synthetic multilayer substrates, which
permits probing species at surfaces and at buried interfaces. First applications of these
methods to metal oxidation, metal oxides, metal alloys, and metallic bilayers will be
considered, and likely future directions of development will be discussed.
Soft X-ray Spectromicroscopy: Quantitative
chemical analysis of functional materials at high spatial resolution
Professor Adam Hitchcock
Chemistry Department, McMaster
University, Ontario, Canada
Chemical analyses of laterally and vertically structured polymeric
systems are being performed with sub-100 nm spatial resolution using
synchrotron- based scanning transmission x-ray microscopy (STXM) at the
Advanced Light Source, Berkeley, CA. Novel methods for converting image
and spectral information to quantitative component maps will be
described. The capabilities will be illustrated by applications to
nano-structured polymer encapsulation materials, to self- organized,
confined multi-layer polymer films, and to engineered polymeric
biomaterials.
Theory of the angular distributions of electrons photoejected from matter by
x-ray photons: Inferences for complex materials from studies of fixed-in-space
and randomly oriented polyatomic molecules
Professor Peter Langhoff
Department of Chemistry, Indiana University, Bloomington,
Indiana, and San Diego Supercomputer Center, University of California, La Jolla,
California, USA
New theoretical descriptions are reported of the dynamics of electrons
photoejected from matter by x-ray photons. The formalism provides explicit
expressions for photoionization cross sections differential in electron ejection angles for both anisotropic materials and an ensemble of randomly
oriented molecules in simple closed forms which distinguish between geometrical, dynamical and target structural aspects of the photoejection
process. Applications of the formalism are given in dipole and nondipole limits
for photoejection from adsorbate or fixed-in-space molecules of
arbitrary point-group symmetry as a vehicle for addressing related processes which can
probe the vibronic degrees of freedom of nanostructures, clusters, surfaces and
complex materials more generally.
Soft X-ray emission spectroscopy in materials
science: A progress report
Professor Joseph Nordgren
Department
of Physics,
Uppsala University, Uppsala, Sweden
The third generation synchrotron radiation sources have made soft X-ray spectroscopy become a new tool to be applied towards a better understanding of complex new materials, processes and technologies. Since only soft X-ray photons are employed it offers some unique and valuable advantages. Most of these are derived from the fact that photons are tunable in energy, carry polarization, have a large penetration depth, are insensitive to electric and magnetic fields, and exhibit coherent properties. The most important properties include element and chemical-state specificity, probing of the true bulk properties and the ability to study buried interfaces with sub-monolayer sensitivity. Also it allows the study of electro-chemical processes at the solid liquid interface or biological samples in their natural wet state.
An account is presented for recent developments in synchrotron radiation based soft X-ray emission studies of materials and surfaces, and examples include studies of solids, interfaces, gases and liquids.
Electronic Band
Shift Measurements of Nanoclusters using Soft X-ray Spectroscopies
Dr. Louis Terminello
Lawrence Livermore National Laboratory, California, U.S.A.
We have used
third generation synchrotron radiation to perform X-ray Absorption
Spectroscopy (XAS), Photoelectron Spectroscopy (PES), and Soft X-ray
Fluorescence (SXF) experiments on a variety of nanostructured materials.
The reduced dimensional materials characterized include diamond, Si, Ge,
and MoS2 nanoclusters ranging is size from 1 12 nM.
In each case we have exploited the element selectivity of the
soft x-ray methods to probe the electronic structure, bonding, and
morphology of these materials as a function of particle size. In
particular, we use soft x-ray probes to determine band-shift and surface
effects in our nanocluster samples. For many of these material systems,
knowledge of band gap widening with quantum confinement, band alignment,
and surface effects is critical to rational design and utilization of
these novel materials in diverse applications.
We
present data obtained from the IBM/U. of Tennessee/Tulane U./LLNL/LBNL
beam line at the Advanced Light Source, Lawrence Berkeley National
Laboratory. The spectral
range of 70-1200 eV covers the sharpest core levels of all elements with
optimum element and chemical environment sensitivity and resolution. The
soft x-ray probes employed in our studies reveal structural information
that would be difficult, if not impossible to uncover using conventional
probes. The high brightness of this new facility has made possible the
element specific probing of dilute materials such as nanoclusters and
thin and buried layers that were previously undetectable. We will report
our results on the nanocluster structures mentioned above, plus
additional self-assembled and thin-film material systems.
Call
for Papers - Deadline
extended to April 28, 2000 ! ! !
Contributed papers are
invited on all fundamental and applied areas of Soft X-ray
Spectroscopy. Both theoretical and experimental work are welcomed.
Please follow the on-line abstract procedure at
http://gold.acs.org/pc2000/pc2000home.html
The organizers of the
Symposium would appreciate a copy of the electronic abstract form so that
appropriate space allocation can be made. Email
Tong here.
Symposium
Organizers
Hisanobu
Wakita, Department of Chemistry, Fukuoka University, Japan
Dennis Lindle, Chemistry
Department, University of Nevada, Las Vegas, U.S.A.
Tong Leung, Chemistry Department,
University of Waterloo, Canada
Rupert Perera, Advanced Light Source, Lawrence Berkeley National
Laboratory, U.S.A.
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